Main product technical features and indicators:

The software interface is user-friendly, scientific, and intuitive. Can be applied to the current exposure area, the area to be exposed, and the exposure parameters
Provide real-time graphical representation of numerical information.
By selecting the back alignment module, double-sided alignment exposure can be achieved, upgrading the model to have dual
Facing the step projection lithography machine with quasi exposure function.
Configure an automatic control system for focal plane detection, which automatically completes the exposure process in real-time after setting the focal plane position
Adjustment of focal plane.
Using a cold light film and i-line illumination system, with an exposure wavelength of 365nm, the exposure surface is cold light, and the exposure is
The shape is square, steep, and straight.
● Supports four types of exposure: vacuum contact exposure, hard contact exposure, pressure contact exposure, and proximity exposure
Function.
Using patented technology - building block misalignment fly eye lens to achieve high uniformity illumination with uneven illumination better than 2%.
Adopting advanced off-axis alignment system, the alignment process is automatically completed, which is very suitable for aligning substrates of various sizes (including fragments).
Alignment accuracy: ± 0.5 μ m.
● Lighting uniformity: 2%.
Exposure area: 3mm × 3mm~50mm × 50mm.
● Focus stage motion sensitivity: 1 μ m.
Mask size: 3 inches, 4 inches, 5 inches.
● Focus table movement stroke: 5mm.
Lithography resolution: 0.3 μ m~5 μ m.
● Focus detection: CCD detection, detection accuracy of 0.5 μ m.
Light source: 350W spherical mercury lamp.
Mercury lamp power: 1000W (DC, imported DC high-pressure mercury lamp from Osram Germany).